is flexible, strong, kink resistant and abrasion resistant. Easily processed in many assembly operations, it retains its properties through a wide temperature range, making it suitable for even low-temperature uses.
U-2000 Ester Base
has a higher specific gravity with better cut, tear and chunking resistance than polyethers. Certain compounds have slightly higher abrasion resistance; heat, oxidation and oil resistance is generally superior.
U-2001 Ether Base
has a greater resistance to hydrolysis, a greater degree of resilience, lower temperature flexibility and is more hydrolytically stable. It is resistant to fungus, micro-organism attack, diluted acids and alkalis.